najoNanosystems: Physics, Chemistry, MathematicsНаносистемы: физика, химия, математика2220-80542305-7971Университет ИТМО10.17586/2220-8054-2016-7-4-621-623najo-1261Research ArticleСтатьиEffect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser depositionEffect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser depositionBalakrishnanG.BalakrishnanG.

Centre of Excellence in Patterned Multiferroics & Nanotechnology

Chennai – 73

Centre of Excellence in Patterned Multiferroics & Nanotechnology

Chennai – 73

balaphysics76@gmail.comManavalanS.ManavalanS.

Department of Mechanical Engineering

Chennai – 73

Department of Mechanical Engineering

Chennai – 73

manavalan.kannan@gmail.comVenkatesh BabuR.Venkatesh BabuR.

Department of Mechanical Engineering

Chennai – 126

Department of Mechanical Engineering

Chennai – 126

rvbaboo76@gmail.comSongJ. I.SongJ. I.

Department of Mechanical Engineering

Changwon – 641773

Department of Mechanical Engineering

Changwon – 641773

jisong@changwon.ac.krBharath Institute of Science and Technology, Bharath Institute of Higher Education and ResearchBharath Institute of Science and Technology, Bharath Institute of Higher Education and ResearchSri Lakshmi Ammal Engineering CollegeSri Lakshmi Ammal Engineering CollegeChanwon National UniversityChanwon National University20162208202574621623Copyright © Balakrishnan G., Manavalan S., Venkatesh Babu R., Song J.I., 20252025Balakrishnan G., Manavalan S., Venkatesh Babu R., Song J.I.Balakrishnan G., Manavalan S., Venkatesh Babu R., Song J.I.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://nanojournal.ifmo.ru/jour/article/view/1261

Titanium oxide (TiO2) films were deposited on silicon (100) and quartz substrates at various substrate temperatures (300 – 873 K) at an optimized oxygen partial pressure of 3.0 × 10−2 mbar by pulsed laser deposition. The effect of substrate temperature on structure, surface morphology and optical properties of the films were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectroscopy (PL) respectively. The XRD results showed that the films are polycrystalline in nature and have tetragonal structure. The film prepared at higher substrate temperature showed strong rutile phase. The results indicated that all the films possess both phases (anatase and rutile) of titania.  The AFM shows the crystalline nature, dense, uniform distribution of the nanocrystallites with a surface roughness of 2 –8 nm. The photoluminescence studies showed the asymmetric peak ∼ 370 nm indicating the bandgap for the TiO2 films.

Titanium oxide (TiO2) films were deposited on silicon (100) and quartz substrates at various substrate temperatures (300 – 873 K) at an optimized oxygen partial pressure of 3.0 × 10−2 mbar by pulsed laser deposition. The effect of substrate temperature on structure, surface morphology and optical properties of the films were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectroscopy (PL) respectively. The XRD results showed that the films are polycrystalline in nature and have tetragonal structure. The film prepared at higher substrate temperature showed strong rutile phase. The results indicated that all the films possess both phases (anatase and rutile) of titania.  The AFM shows the crystalline nature, dense, uniform distribution of the nanocrystallites with a surface roughness of 2 –8 nm. The photoluminescence studies showed the asymmetric peak ∼ 370 nm indicating the bandgap for the TiO2 films.

titaniathin filmspulsed laser depositionX-ray diffraction (XRD)atomic force microscopy (AFM)photoluminescence spectroscopytitaniathin filmspulsed laser depositionX-ray diffraction (XRD)atomic force microscopy (AFM)photoluminescence spectroscopyReferencesGyorgy E., Socol G., et al. Appl. Surf. Sci., 2005, 247 (4), P. 429–433.Gyorgy E., Socol G., et al. Appl. Surf. Sci., 2005, 247 (4), P. 429–433.Tay B.K., Zhao Z.W., Chua D.H.C. Mater. Sci. Eng. Rep., 2006, 52 (1), P. 178–182.Tay B.K., Zhao Z.W., Chua D.H.C. Mater. Sci. Eng. Rep., 2006, 52 (1), P. 178–182.Byun C., Jang J.W., et al. Mater. Res. Bull., 1997, 32 (5), P. 431–440.Byun C., Jang J.W., et al. Mater. Res. Bull., 1997, 32 (5), P. 431–440.Vorotilov K.A., Drlova E.V., Petrovsky V.L. Thin Solid Films, 1992, 207, P. 135–144.Vorotilov K.A., Drlova E.V., Petrovsky V.L. Thin Solid Films, 1992, 207, P. 135–144.Pulker H.K., Paesold G., Ritter E. Appl. Opt., 1976, 15, P. 2986.Pulker H.K., Paesold G., Ritter E. Appl. Opt., 1976, 15, P. 2986.Lu J.P., Wang J., Raj R. Thin Solid Films, 1991, 204, L13.Lu J.P., Wang J., Raj R. Thin Solid Films, 1991, 204, L13.Suhail M.H., Mohan Rao G., Mohan S.J. Appl. Phys., 1992, 71 (3), P. 1421.Suhail M.H., Mohan Rao G., Mohan S.J. Appl. Phys., 1992, 71 (3), P. 1421.Argelia Perez-Pacheco, Prieto C., Castaneda-Guzma R., Garcia-Lopez J. Thin Solid Films, 2009, 517, P. 5415.Argelia Perez-Pacheco, Prieto C., Castaneda-Guzma R., Garcia-Lopez J. Thin Solid Films, 2009, 517, P. 5415.Balakrishnan G., Vengala Rao Bandi, et al. Mater. Res. Bull., 2013, 48, P. 4901.Balakrishnan G., Vengala Rao Bandi, et al. Mater. Res. Bull., 2013, 48, P. 4901.Ben Amor S., Baud G., Besse J.P., Jacquet M. Mater. Sci. Eng. B, 1997, 47, P. 110.Ben Amor S., Baud G., Besse J.P., Jacquet M. Mater. Sci. Eng. B, 1997, 47, P. 110.Chung C.K., Liao M.W., Lai C.W. Thin Solid Films, 2009, 518, P. 1415.Chung C.K., Liao M.W., Lai C.W. Thin Solid Films, 2009, 518, P. 1415.Madhu Kumar P., Badrinarayanan S., Murali S. Thin Solid Films, 2000, 358, P. 122.Madhu Kumar P., Badrinarayanan S., Murali S. Thin Solid Films, 2000, 358, P. 122.Gaurav Shukla, Pratima K. Mishra, Alika Khare. J. Alloy Compd., 2010, 489, P. 246.Gaurav Shukla, Pratima K. Mishra, Alika Khare. J. Alloy Compd., 2010, 489, P. 246.

The authors declare that there are no conflicts of interest present.