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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">najo</journal-id><journal-title-group><journal-title xml:lang="en">Nanosystems: Physics, Chemistry, Mathematics</journal-title><trans-title-group xml:lang="ru"><trans-title>Наносистемы: физика, химия, математика</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-8054</issn><issn pub-type="epub">2305-7971</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17586/2220-8054-2026-17-2-187-192</article-id><article-id custom-type="elpub" pub-id-type="custom">najo-1759</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>PHYSICS</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ФИЗИКА</subject></subj-group></article-categories><title-group><article-title>How to make opposite state store again</article-title><trans-title-group xml:lang="ru"><trans-title>Как вновь заставить хранить инверсное состояние</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-8901-5051</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Кузьмичев</surname><given-names>Д. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Kuzmichev</surname><given-names>D. S.</given-names></name></name-alternatives><bio xml:lang="en"><p>Dmitry S. Kuzmichev </p><p>Institutskii per. 9, 141700 Dolgoprudny, Moscow region </p></bio><email xlink:type="simple">kuzmichev.ds@mipt.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-9112-4898</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Константинов</surname><given-names>В. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Konstantinov</surname><given-names>V. S.</given-names></name></name-alternatives><bio xml:lang="en"><p>Vyacheslav S. Konstantinov  </p><p>Institutskii per. 9, 141700 Dolgoprudny, Moscow region </p><p>Akademika Valieva st. 6/1, 124460 Zelenograd</p></bio><email xlink:type="simple">vkonstantinov@niime.ru</email><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0000-0204-5104</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Сизых</surname><given-names>Н. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Sizykh</surname><given-names>N. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Nikita A. Sizykh </p><p>Institutskii per. 9, 141700 Dolgoprudny, Moscow region </p></bio><email xlink:type="simple">sizykh.na@mipt.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0003-0707-8567</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Хакимов</surname><given-names>Р. Р.</given-names></name><name name-style="western" xml:lang="en"><surname>Khakimov</surname><given-names>R. R.</given-names></name></name-alternatives><bio xml:lang="en"><p>Roman R. Khakimov </p><p>Institutskii per. 9, 141700 Dolgoprudny, Moscow region </p></bio><email xlink:type="simple">khakimov.rr@mipt.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Moscow Institute of Physics and Technology</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-2"><institution>Moscow Institute of Physics and Technology ; Molecular Electronics Research Institute</institution><country>Russian Federation</country></aff><pub-date pub-type="collection"><year>2026</year></pub-date><pub-date pub-type="epub"><day>30</day><month>04</month><year>2026</year></pub-date><volume>17</volume><issue>2</issue><fpage>187</fpage><lpage>192</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Kuzmichev D.S., Konstantinov V.S., Sizykh N.A., Khakimov R.R., 2026</copyright-statement><copyright-year>2026</copyright-year><copyright-holder xml:lang="ru">Кузьмичев Д.С., Константинов В.С., Сизых Н.А., Хакимов Р.Р.</copyright-holder><copyright-holder xml:lang="en">Kuzmichev D.S., Konstantinov V.S., Sizykh N.A., Khakimov R.R.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://nanojournal.ifmo.ru/jour/article/view/1759">https://nanojournal.ifmo.ru/jour/article/view/1759</self-uri><abstract><p>The article shows the possibility of increasing the storage time of the opposite state (OS) at a temperature of 145 °C from 140 to 500 minutes in ferroelectric capacitors based on Hf0.5Zr0.5O2 (HZO) by shift of current integration endpoint to right. Consideration of transient processes between measurement pulses after 500 minutes capacitors baking at 145 °C can enhance the OS retention from 21 to 35 % of the preheating state. Opposite trend detected for the same sate (SS) (decrease from 56 to 35 %) and new same state (NSS) (decrease from 63 to 45 %). It is also shown that the presence of a voltage shift caused by an imprint in some cases may not lead to a loss of polarization due to the current flowing during the flat part of the trapezoidal voltage pulse.</p></abstract><trans-abstract xml:lang="ru"><p>В настоящей статье показана возможность увеличить время хранения инверсного состояния OS с 140 до 500 мин при 145 ℃ в сегнетоэлектрических конденсаторах на основе Hf0.5Zr0.5O2 (HZO) путем сдвига вправо конечной точки интегрирования тока. Учет переходных процессов между управляющими импульсами после отжига в течение 500 мин при температуре 145 ℃ позволяет повысить сохраняемость состояния OS с 21 % до 35 % от начального значения. Противоположная тенденция выявлена для состояний SS (снижение с 56 % до 35 %) и NSS (снижение с 63 % до 45 %). Также показано, что наличие сдвига напряжения, вызванного эффектом импринта, в некоторых случаях может и не приводить деградации поляризации благодаря току, который протекает на полке максимального напряжения управляющего импульса.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>TiN/HZO/TiN</kwd><kwd>сохраняемость</kwd><kwd>импринт</kwd><kwd>сегнетоэлектрик</kwd></kwd-group><kwd-group xml:lang="en"><kwd>TiN/HZO/TiN</kwd><kwd>retention</kwd><kwd>imprint</kwd><kwd>ferroelectric</kwd></kwd-group><funding-group><funding-statement xml:lang="en">This work supported in part by the Foundation for Advanced Research (Project “Magnit”), in part by Ministry of Science and Higher Education of the Russian Federation in the scope of the government assignment (Agreement 075-03-2026-305 16.01.2026, project FSMG-2026-0021). The authors also acknowledge the MIPT Shared Facilities Center for access to the equipment. The authors are grateful to Andrey Markeev and Aleksey Azov for manufacturing support.</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Müller J., Polakowski P., Mueller S., Mikolajick T. Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects. ECS Journal of Solid State Science and Technology, 2015, 4 (5), P. N30–N35.</mixed-citation><mixed-citation xml:lang="en">Müller J., Polakowski P., Mueller S., Mikolajick T. Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects. ECS Journal of Solid State Science and Technology, 2015, 4 (5), P. 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