najoNanosystems: Physics, Chemistry, MathematicsНаносистемы: физика, химия, математика2220-80542305-7971Университет ИТМО10.17586/2220-8054-2020-11-4-424-433najo-411Research ArticleCHEMISTRY AND MATERIALS SCIENCEХИМИЯ И НАУКА О МАТЕРИАЛАХMoO3:In2O3 binary oxide thin films as CO gas sensorKothawadeNimba

Kalwan (Manur), Nashik

BorseJitendra

Risod

jaborse@gmail.comDeshmaneVikas

Ambernath, Thane, Maharashtra

PatilArun

Panchavati, Nashik

Department of Physics, Arts, Commerce and Science CollegeIndiaDepartment of Physics, Late Pushpadevi Patil Arts and Science CollegeIndiaDepartment of Physics, SICES Degree CollegeIndiaResearch centre in electronics science, LVH CollegeIndia202029072025114424–433Copyright © Kothawade N., Borse J., Deshmane V., Patil A., 20252025Kothawade N., Borse J., Deshmane V., Patil A.Kothawade N., Borse J., Deshmane V., Patil A.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://nanojournal.ifmo.ru/jour/article/view/411

Thin films of binary oxides (MoO3–In2O3) of different normality proportions of 0.1N:0.1N, 0.2N:0.1N, 0.3N:0.1N, 0.1N:0.2N, 0.2N:0.2N, 0.3N:0.2N, 0.1N:0.3N, 0.2N:0.3N and 0.3N:0.3N were prepared by a spray pyrolysis technique on glass substrates at 400◦C. The prepared films were characterized using X-ray diffraction (XRD), scanning electron microscope (SEM) and energy dispersive analysis by x-ray spectra (EDAX). The electrical and gas sensing properties of the films were studied using static gas sensing apparatus. The electrical analysis confirmed that the resistivity of films increased by adding MoO3 as the dopant in In2O3. The maximum resistivity of film was found 1.75×104 Ωm for 0.3N (MoO3) and 0.1N (In2O3) binary oxide films. The films were tested against five different target gases. The composition ratio 0.3N:0.1N films showed the 70.50% sensitivity for 300 ppm CO gas at 150◦C. The response time (15 s) and recovery time (25 s) was found to be quick. The % selectivity was maximum for 0.3N:0.1N films.

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The authors declare that there are no conflicts of interest present.