najoNanosystems: Physics, Chemistry, MathematicsНаносистемы: физика, химия, математика2220-80542305-7971Университет ИТМО10.17586/2220-8054-2020-11-4-488-492najo-419Research ArticleCHEMISTRY AND MATERIALS SCIENCEХИМИЯ И НАУКА О МАТЕРИАЛАХFabrication and characterization of spectrally selective glazing dielectric multilayer structuresYepuriVenkatesh

Seetharampuram, Narsapur (A.P.)

Gurgaon, (Haryana)

DubeyR. S.

Seetharampuram, Narsapur (A.P.)

rag_pcw@yahoo.co.inKumarBrijesh

Gurgaon, (Haryana)

Department of Nanotechnology, Swarnandhra College of Engineering and Technology; Amity Institiute of Nanotechnology, Amity UniversityIndiaDepartment of Nanotechnology, Swarnandhra College of Engineering and TechnologyIndiaAmity Institiute of Nanotechnology, Amity UniversityIndia202029072025114488–492Copyright © Yepuri V., Dubey R.S., Kumar B., 20252025Yepuri V., Dubey R.S., Kumar B.Yepuri V., Dubey R.S., Kumar B.This work is licensed under a Creative Commons Attribution 4.0 License.https://nanojournal.ifmo.ru/jour/article/view/419

We report the fabrication of three- and five-layered based TiO2/SiO2 dielectric structures as the back-end reflector application in thin film silicon solar cells. These dielectric structures are prepared by the combined sol-gel and spin-coating techniques. X-ray diffraction (XRD) analysis of both the three- and five-layered based structures confirmed the anatase phase of TiO2 with its dominant peak at 2θ = 25◦. Field-emission scanning electron microscopy (FESEM) study demonstrated the formation of three and five alternate layers of TiO2 and SiO2 films. Comparatively, five-layered based reflector yielded the maximum (100 %) reflectance in the near-infrared (NIR) wavelength region as evidenced by the UV-Vis spectroscopy investigation.

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The authors declare that there are no conflicts of interest present.