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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">najo</journal-id><journal-title-group><journal-title xml:lang="en">Nanosystems: Physics, Chemistry, Mathematics</journal-title><trans-title-group xml:lang="ru"><trans-title>Наносистемы: физика, химия, математика</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-8054</issn><issn pub-type="epub">2305-7971</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17586/2220-8054-2024-15-4-520-529</article-id><article-id custom-type="elpub" pub-id-type="custom">najo-44</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>CHEMISTRY AND MATERIALS SCIENCE</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ХИМИЯ И НАУКА О МАТЕРИАЛАХ</subject></subj-group></article-categories><title-group><article-title>Phase formation of nanosized InGaZnO4 obtained by the sol-gel method with different chelating agents.</article-title><trans-title-group xml:lang="ru"><trans-title>Фазообразование наноразмерного InGaZnO4 полученного золь-гель методом с различными комплексообразователями</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0008-4546-1368</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Зирник</surname><given-names>Г. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Zirnik</surname><given-names>G. M.</given-names></name></name-alternatives><bio xml:lang="en"><p>Gleb M. Zirnik Laboratory of Semiconductor Oxide Materials</p><p>Institutsklane, 9, Dolgoprudny, 141701</p><p>Institute of Chemistry</p><p>Universitetskaya emb., 7–9, 199034</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-7117-7132</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Чернуха</surname><given-names>А. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Chernukha</surname><given-names>A. S.</given-names></name></name-alternatives><bio xml:lang="en"><p>Alexander S. Chernukha  Laboratory of Semiconductor Oxide MaterialsInstitutsky lane, 9, Dolgoprudny, 141701</p><p>Institute of Chemistry</p><p>Universitetskaya emb., 7–9, 199034</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-8623-4769</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Учаев</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Uchaev</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Daniil A. Uchaev Scientific and Educational Center “Nanotechnologies”</p><p>Lenin Av., 76, Chelyabinsk, 454080</p></bio><xref ref-type="aff" rid="aff-3"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0001-6973-4633</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Солизода</surname><given-names>И. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Solizoda</surname><given-names>I. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Ibrohimi A. Solizoda Laboratory of Semiconductor Oxide MaterialsInstitutsky lane, 9, Dolgoprudny, 141701</p><p>Institute of Chemistry</p><p>Universitetskayemb., 7–9, 199034</p><p>Rudaki Av., 17, Dushanbe, 734025</p></bio><xref ref-type="aff" rid="aff-4"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-3028-947X</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Гудкова</surname><given-names>С. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Gudkova</surname><given-names>S. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Svetlana A. Gudkova Laboratory of Semiconductor Oxide MaterialsInstitutsky lane, 9, Dolgoprudny, 141701</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0009-0002-1921-7915</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Некорыснова</surname><given-names>Н. С.</given-names></name><name name-style="western" xml:lang="en"><surname>Nekorysnova</surname><given-names>N. S.</given-names></name></name-alternatives><bio xml:lang="en"><p>Nadezhda S. Nekorysnova Scientific and Educational Center “Nanotechnologies”</p><p>Lenin Av., 76, Chelyabinsk, 454080</p></bio><xref ref-type="aff" rid="aff-5"/></contrib><contrib contrib-type="author" corresp="yes"><contrib-id contrib-id-type="orcid">https://orcid.org/0000-0002-5190-9834</contrib-id><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Винник</surname><given-names>Д. А.</given-names></name><name name-style="western" xml:lang="en"><surname>Vinnik</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Denis A. Vinnik  Laboratory of Semiconductor Oxide Materials</p><p>Institutsky lane, 9, Dolgoprudny, 141701</p><p>Institute of Chemistry</p><p>Universitetskaya emb., 7–9, 199034</p><p>Scientific and Educational Center “Nanotechnologies”Lenin Av., 76, Chelyabinsk, 454080</p></bio><email xlink:type="simple">vinnikda@susu.ru</email><xref ref-type="aff" rid="aff-6"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Moscow Institute of Physics and Technology; St. Petersburg State University</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-2"><institution>Moscow Institute of Physics and Technology; St. Petersburg State University,; South Ural State University</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-3"><institution>South Ural State University</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-4"><institution>Moscow Institute of Physics and Technology; St. Petersburg State University; Tajik National University</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-5"><institution>Moscow Institute of Physics and Technology</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-6"><institution>Moscow Institute of Physics and Technology; St. Petersburg State University; South Ural State University</institution><country>Russian Federation</country></aff><pub-date pub-type="collection"><year>2024</year></pub-date><pub-date pub-type="epub"><day>31</day><month>05</month><year>2025</year></pub-date><volume>15</volume><issue>4</issue><fpage>520</fpage><lpage>529</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Zirnik G.M., Chernukha A.S., Uchaev D.A., Solizoda I.A., Gudkova S.A., Nekorysnova N.S., Vinnik D.A., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Зирник Г.М., Чернуха А.С., Учаев Д.А., Солизода И.А., Гудкова С.А., Некорыснова Н.С., Винник Д.А.</copyright-holder><copyright-holder xml:lang="en">Zirnik G.M., Chernukha A.S., Uchaev D.A., Solizoda I.A., Gudkova S.A., Nekorysnova N.S., Vinnik D.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://nanojournal.ifmo.ru/jour/article/view/44">https://nanojournal.ifmo.ru/jour/article/view/44</self-uri><abstract><p>The production of nano-sized semiconductor oxide materials, such as indium-gallium-zinc oxide (IGZO), will make it possible to use it for the transistors manufacture using printing methods. The sol-gel method is one of the widely known and used methods for producing nano-sized oxide materials. As is known, a chelating reagent (complexing agent) can influence both the synthesis process and the final phase composition. The results of sol-gel synthesis with various chelating reagents: citric acid, ethylene glycol, oxalic acid, urea, glycerol and sucrose are presented. The samples were studied by X-ray diffraction. It was found that ethylene glycol and glycerol as chelating reagents make it possible to obtain a homogeneous crystalline material at 900 ◦C with a YbFe2O4-type structure, R-3m (166) space group. Unit cell parameters and crystallite size (Halder-Wagner method) for InGaZnO4 single-phase samples were calculated</p></abstract><trans-abstract xml:lang="ru"><p>Получение наноразмерных полупроводниковых оксидных материалов, каким является тройной оксид индия-галлия-цинка, позволит применить последний для изготовления транзисторов перспективными печатными методами. Золь-гель метод является одним из широко известных и используемых методов получения наноразмерных оксидных материалов. Известно, что использование комплексообразователя влияет на ход синтеза и фазовый состав конечного продукта. В статье представлены результаты исследования процесса золь-гель синтеза с рядом нескольких комплексообразователей: лимонной кислотой, этиленгликолем, щавелевой кислотой, мочевиной, глицерином и сахарозой. Образцы исследованы методом рентгенофазового анализа. Установлено, что использование этиленгликоля и глицерина позволяет после нагревания до 900 °С получить однофазный кристаллический материал со структурой типа YbFe2O4 и пространственной группой R-3m (166). Для однофазных образцов рассчитаны параметры элементарной ячейки, также по методу Гальдера-Вагнера оценён размер области когерентного рассеяния (кристаллитов).</p></trans-abstract><kwd-group xml:lang="ru"><kwd>Оксид индия-галлия-цинка</kwd><kwd>In-Ga-Zn-O</kwd><kwd>золь-гель метод</kwd><kwd>комплексообразователь</kwd><kwd>хелатирующий реагент</kwd><kwd>фазообразование</kwd><kwd>наноматериал</kwd></kwd-group><kwd-group xml:lang="en"><kwd>indium-gallium-zinc oxide</kwd><kwd>In-Ga-Zn-O</kwd><kwd>IGZO</kwd><kwd>sol-gel method</kwd><kwd>complexing agent</kwd><kwd>chelating reagent</kwd><kwd>phase formation</kwd><kwd>nanomaterial</kwd></kwd-group><funding-group><funding-statement xml:lang="en">This study represents an integration of two diverse projects supported by the Rus- sian Science Foundation (No. 24-19-00468; conceptualization, comparative analysis of the chelating agents influence on the synthesis processes, as well as the synthesis and detailed characterization of samples IGZO- 3, IGZO-4, IGZO-5, IGZO-6) and the Ministry of Science and Higher Education of the Russian Federation (Goszadaniye No. 075-03-2024-117, project No. FSMG-2024-0028; syntheses of IGZO-1 and IGZO-2 and its characterization).</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Kim G.H., Kim H.S., Shin H.S., Ahn B.D., Kim K.H., Kim H.J. 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