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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">najo</journal-id><journal-title-group><journal-title xml:lang="en">Nanosystems: Physics, Chemistry, Mathematics</journal-title><trans-title-group xml:lang="ru"><trans-title>Наносистемы: физика, химия, математика</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-8054</issn><issn pub-type="epub">2305-7971</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.17586/2220-8054-2017-8-6-823-829</article-id><article-id custom-type="elpub" pub-id-type="custom">najo-661</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>CHEMISTRY AND MATERIALS SCIENCE</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ХИМИЯ И НАУКА О МАТЕРИАЛАХ</subject></subj-group></article-categories><title-group><article-title>Preparation of Au/TiO2/Ti memristive elements via anodic oxidation</article-title><trans-title-group xml:lang="ru"><trans-title>Preparation of Au/TiO2/Ti memristive elements via anodic oxidation</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Morozova</surname><given-names>P. A.</given-names></name><name name-style="western" xml:lang="en"><surname>Morozova</surname><given-names>P. A.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Skolkovo, Nobel Street, 3, Moscow Region, 143026; Leninskie gory, 1, building 73, Moscow, 119991</p></bio><bio xml:lang="en"><p>Skolkovo, Nobel Street, 3, Moscow Region, 143026; Leninskie gory, 1, building 73, Moscow, 119991</p></bio><email xlink:type="simple">polina.morozova@skoltech.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Petukhov</surname><given-names>D. I.</given-names></name><name name-style="western" xml:lang="en"><surname>Petukhov</surname><given-names>D. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Leninskie gory, 1, building 73, Moscow, 119991</p></bio><bio xml:lang="en"><p>Leninskie gory, 1, building 73, Moscow, 119991</p></bio><email xlink:type="simple">di.petukhov@gmail.com</email><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Skolkovo Institute of Science and Technology; Lomonosov Moscow State University, Department of Materials Science</institution></aff><aff xml:lang="en"><institution>Skolkovo Institute of Science and Technology; Lomonosov Moscow State University, Department of Materials Science</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Lomonosov Moscow State University, Department of Materials Science</institution></aff><aff xml:lang="en"><institution>Lomonosov Moscow State University, Department of Materials Science</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2017</year></pub-date><pub-date pub-type="epub"><day>12</day><month>08</month><year>2025</year></pub-date><volume>8</volume><issue>6</issue><fpage>823</fpage><lpage>829</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Morozova P.A., Petukhov D.I., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Morozova P.A., Petukhov D.I.</copyright-holder><copyright-holder xml:lang="en">Morozova P.A., Petukhov D.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://nanojournal.ifmo.ru/jour/article/view/661">https://nanojournal.ifmo.ru/jour/article/view/661</self-uri><abstract><p>In the present paper we report utilization of porous and barrier type of titania films formed by anodic oxidation as an active layer of the memristive element in the Au–TiO2–Ti structure. The comparison of semiconductor properties of porous and barrier type of anodic titania was performed via the Mott–Schottky technique. The obtained memristive elements show the bipolar type of switching governed by Schottky barrier screening. For barrier type film the switching potential is equal to −1.5 V and the ratio of resistance in OFF and ON stage (Roff /Ron) is equal to 34. For porous type films, the switching potential is equal to −0.6 V and Roff /Ron = 131. Moreover, we observed the dependence of Roff /Ron on the voltage sweeping rate, which can be explained by the limitation in diffusion of oxygen vacancies through the oxide layer.</p></abstract><trans-abstract xml:lang="ru"><p>In the present paper we report utilization of porous and barrier type of titania films formed by anodic oxidation as an active layer of the memristive element in the Au–TiO2–Ti structure. The comparison of semiconductor properties of porous and barrier type of anodic titania was performed via the Mott–Schottky technique. The obtained memristive elements show the bipolar type of switching governed by Schottky barrier screening. For barrier type film the switching potential is equal to −1.5 V and the ratio of resistance in OFF and ON stage (Roff /Ron) is equal to 34. For porous type films, the switching potential is equal to −0.6 V and Roff /Ron = 131. Moreover, we observed the dependence of Roff /Ron on the voltage sweeping rate, which can be explained by the limitation in diffusion of oxygen vacancies through the oxide layer.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>memristor</kwd><kwd>anodic titania</kwd><kwd>anodic oxidation</kwd><kwd>memristive element</kwd><kwd>Schottky barrier</kwd><kwd>oxygen vacancies diffusion</kwd></kwd-group><kwd-group xml:lang="en"><kwd>memristor</kwd><kwd>anodic titania</kwd><kwd>anodic oxidation</kwd><kwd>memristive element</kwd><kwd>Schottky barrier</kwd><kwd>oxygen vacancies diffusion</kwd></kwd-group><funding-group><funding-statement xml:lang="en">The work is supported by Russian Foundation of Basic Research Grant No. 16-08-00574 and Lomonosov Moscow State University Development Programme. 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