najoNanosystems: Physics, Chemistry, MathematicsНаносистемы: физика, химия, математика2220-80542305-7971Университет ИТМО10.17586/2220-8054-2016-7-1-81-86najo-799Research ArticlePAPERS, PRESENTED AT THE CONFERENCEPAPERS, PRESENTED AT THE CONFERENCEEtching of wrinkled graphene oxide films in noble gas atmosphere under UV irradiationEtching of wrinkled graphene oxide films in noble gas atmosphere under UV irradiationAleksenskiiА. E.AleksenskiiA. E.

St. Petersburg

St. Petersburg

Vul’S. P.Vul’S. P.

St. Petersburg

St. Petersburg

DideikinA. T.DideikinA. T.

St. Petersburg

St. Petersburg

SakharovV. I.SakharovV. I.

St. Petersburg

St. Petersburg

SerenkovI. T.SerenkovI. T.

St. Petersburg

St. Petersburg

RabchinskiiM. K.RabchinskiiM. K.

St. Petersburg

St. Petersburg

Maxrabchinskii@gmail.comAfrosimovV. V.AfrosimovV. V.

St. Petersburg

St. Petersburg

Ioffe InstituteIoffe Institute20161408202571Special Issue: Proceedings of the 12th Biennial International Conference “Advanced Carbon Nanostructures” (ACNS’2015)8186Copyright © Aleksenskii A.E., Vul’ S.P., Dideikin A.T., Sakharov V.I., Serenkov I.T., Rabchinskii M.K., Afrosimov V.V., 20252025Aleksenskii А.E., Vul’ S.P., Dideikin A.T., Sakharov V.I., Serenkov I.T., Rabchinskii M.K., Afrosimov V.V.Aleksenskii A.E., Vul’ S.P., Dideikin A.T., Sakharov V.I., Serenkov I.T., Rabchinskii M.K., Afrosimov V.V.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://nanojournal.ifmo.ru/jour/article/view/799

We have studied the process of UV reduction of wrinkled grahpene oxide films, deposited on silicon substrate from ethanol suspension. In order to avoid destruction of graphene oxide via ozone formation from ambient air, samples were protected by argon atmosphere during UV irradiation. Using the analysis of back scattering spectra for medium energy ions, we have found that the UV irradiation mediated reduction process produced significantly decreased carbon content on the substrate surface. The decrease in the carbon content was accompanied by a smoothing of the films during reduction to graphene. We suppose that the observed effect is related to the oxidation of carbon atoms in the graphene scaffold of graphene oxide to carbon monoxide or dioxide by the oxygen from the graphene oxide (GO) itself. One has to consider this when developing a process for the preparation of graphene films using the UV-mediated reduction of graphene oxide.

We have studied the process of UV reduction of wrinkled grahpene oxide films, deposited on silicon substrate from ethanol suspension. In order to avoid destruction of graphene oxide via ozone formation from ambient air, samples were protected by argon atmosphere during UV irradiation. Using the analysis of back scattering spectra for medium energy ions, we have found that the UV irradiation mediated reduction process produced significantly decreased carbon content on the substrate surface. The decrease in the carbon content was accompanied by a smoothing of the films during reduction to graphene. We suppose that the observed effect is related to the oxidation of carbon atoms in the graphene scaffold of graphene oxide to carbon monoxide or dioxide by the oxygen from the graphene oxide (GO) itself. One has to consider this when developing a process for the preparation of graphene films using the UV-mediated reduction of graphene oxide.

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The authors declare that there are no conflicts of interest present.