<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">najo</journal-id><journal-title-group><journal-title xml:lang="en">Nanosystems: Physics, Chemistry, Mathematics</journal-title><trans-title-group xml:lang="ru"><trans-title>Наносистемы: физика, химия, математика</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-8054</issn><issn pub-type="epub">2305-7971</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">najo-893</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>CHEMISTRY AND MATERIALS SCIENCE</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ХИМИЯ И НАУКА О МАТЕРИАЛАХ</subject></subj-group></article-categories><title-group><article-title>Effect of the mild method of formation VxOy/InP structures using V2O5 gel on the process of their oxidation and composition of nanosized oxide films</article-title><trans-title-group xml:lang="ru"><trans-title></trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Mittova</surname><given-names>I. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Voronezh</p></bio><email xlink:type="simple">inorg@chem.vsu.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Tomina</surname><given-names>E. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Voronezh</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Sladkopevtcev</surname><given-names>B. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Voronezh</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Voronezh State University</institution><country>Russian Federation</country></aff><pub-date pub-type="collection"><year>2014</year></pub-date><pub-date pub-type="epub"><day>14</day><month>08</month><year>2025</year></pub-date><volume>5</volume><issue>2</issue><elocation-id>307–314</elocation-id><permissions><copyright-statement>Copyright &amp;#x00A9; Mittova I.A., Tomina E.V., Sladkopevtcev B.V., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Mittova I.A., Tomina E.V., Sladkopevtcev B.V.</copyright-holder><copyright-holder xml:lang="en">Mittova I.A., Tomina E.V., Sladkopevtcev B.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://nanojournal.ifmo.ru/jour/article/view/893">https://nanojournal.ifmo.ru/jour/article/view/893</self-uri><abstract><p>A VxOy/InP structure was formed by the deposition of a V2O5 gel aerosol on an InP surface, followed by thermal annealing. This approach avoids chemostimulator interactions with the substrate prior to thermal oxidation, which is characteristic of ‘hard’ methods of chemostimulator deposition. The oxidation process of such structures occurs in the transit mechanism with a slight increase growth rate of films by 20–40 % in comparison with the oxidation of InP. The transit action of chemostimulator has been associated with the chemical bonding of V2O5 into InVO4 (XRD), which predominates over mutual transformations of vanadium oxide, which forms in different oxidation states.</p></abstract><kwd-group xml:lang="en"><kwd>indium phosphide</kwd><kwd>chemical stimulated oxidation</kwd><kwd>V2O5 gel</kwd></kwd-group><funding-group><funding-statement xml:lang="en">This work was supported by the Ministry of Education and Science of the Russian Federation in line with government order for Higher Education Institutions in the field of science for 2014-2016 years (project No. 673) and by RFBR grant No. 13-03-00705-a.</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">J. Henry, J. Livingstone. Design, fabrication, and characterization of photonic devices II. Proc. SPIE, 4594, P. 447 (2001).</mixed-citation><mixed-citation xml:lang="en">J. Henry, J. Livingstone. Design, fabrication, and characterization of photonic devices II. Proc. SPIE, 4594, P. 447 (2001).</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Nikolaev Yu.A., Rud’ Yu.V., Terukov E.I., Rud’ V.Yu. Photosensitivity of heterojunctions obtained using thermal oxidation of indium phosphide. Technical Physics Letters, 33 (4), P. 313–315 (2007).</mixed-citation><mixed-citation xml:lang="en">Nikolaev Yu.A., Rud’ Yu.V., Terukov E.I., Rud’ V.Yu. Photosensitivity of heterojunctions obtained using thermal oxidation of indium phosphide. Technical Physics Letters, 33 (4), P. 313–315 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Schimper H.-J., Kollonitsch Z., et al. Material studies regarding InP-based high-eficiency solar cells. Journal of Crystal Growth, 287 (2), P. 642–646 (2006).</mixed-citation><mixed-citation xml:lang="en">Schimper H.-J., Kollonitsch Z., et al. Material studies regarding InP-based high-eficiency solar cells. Journal of Crystal Growth, 287 (2), P. 642–646 (2006).</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Lee S., Kim H.J., et al. Transferred-substrate InP/InGaAs/InP double heterojunction bipolar transistors with fmax =425 GHz. Electronics Letters, 37 (17), P. 1096–1098 (2001).</mixed-citation><mixed-citation xml:lang="en">Lee S., Kim H.J., et al. Transferred-substrate InP/InGaAs/InP double heterojunction bipolar transistors with fmax =425 GHz. Electronics Letters, 37 (17), P. 1096–1098 (2001).</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Wilmsen C.W. Oxide layers on III-V compound semiconductors. Thin solid films, 30, P. 105–117 (1976).</mixed-citation><mixed-citation xml:lang="en">Wilmsen C.W. Oxide layers on III-V compound semiconductors. Thin solid films, 30, P. 105–117 (1976).</mixed-citation></citation-alternatives></ref><ref id="cit6"><label>6</label><citation-alternatives><mixed-citation xml:lang="ru">Yamaguchi M., Ando K. Thermal oxidation of InP and properties of oxide films. J. Appl. Phys., 5 (9), P. 5007–5012 (1980).</mixed-citation><mixed-citation xml:lang="en">Yamaguchi M., Ando K. Thermal oxidation of InP and properties of oxide films. J. Appl. Phys., 5 (9), P. 5007–5012 (1980).</mixed-citation></citation-alternatives></ref><ref id="cit7"><label>7</label><citation-alternatives><mixed-citation xml:lang="ru">Berman L.S., Gabaraeva A.D., et al. Temporal drift parameter interface indium phosphide – silicon dioxide. Technical Physics Letters, 22 (2), P. 65–69 (1996).</mixed-citation><mixed-citation xml:lang="en">Berman L.S., Gabaraeva A.D., et al. Temporal drift parameter interface indium phosphide – silicon dioxide. Technical Physics Letters, 22 (2), P. 65–69 (1996).</mixed-citation></citation-alternatives></ref><ref id="cit8"><label>8</label><citation-alternatives><mixed-citation xml:lang="ru">Pulver D., Wilmsen C.W., Niles D., Kee R. Thermal oxides of In0.5Ga0.5P and In0.5Al0.5P. Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures, 19, P. 207–214 (2001).</mixed-citation><mixed-citation xml:lang="en">Pulver D., Wilmsen C.W., Niles D., Kee R. Thermal oxides of In0.5Ga0.5P and In0.5Al0.5P. Journal of Vacuum Science &amp; Technology B: Microelectronics and Nanometer Structures, 19, P. 207–214 (2001).</mixed-citation></citation-alternatives></ref><ref id="cit9"><label>9</label><citation-alternatives><mixed-citation xml:lang="ru">Pakes A., Skeldon P., et al. Composition and growth of anodic and thermal oxides on InP and GaAs. Surface and Interface Analysis, 34, P. 481–484 (2002).</mixed-citation><mixed-citation xml:lang="en">Pakes A., Skeldon P., et al. Composition and growth of anodic and thermal oxides on InP and GaAs. Surface and Interface Analysis, 34, P. 481–484 (2002).</mixed-citation></citation-alternatives></ref><ref id="cit10"><label>10</label><citation-alternatives><mixed-citation xml:lang="ru">Belyakova E.D. Investigation of InP own oxides. Surface. Physics, chemistry, mechanics, 7, P. 88–93 (1992).</mixed-citation><mixed-citation xml:lang="en">Belyakova E.D. Investigation of InP own oxides. Surface. Physics, chemistry, mechanics, 7, P. 88–93 (1992).</mixed-citation></citation-alternatives></ref><ref id="cit11"><label>11</label><citation-alternatives><mixed-citation xml:lang="ru">Mittova I.Ya., Pshestanchik V.R. The chemistry of processes which create dielectric layers with functional group substituents on semiconductors by impurity thermo-oxidation. Russian chemical reviews, 60 (9), P. 967– 979 (1991).</mixed-citation><mixed-citation xml:lang="en">Mittova I.Ya., Pshestanchik V.R. The chemistry of processes which create dielectric layers with functional group substituents on semiconductors by impurity thermo-oxidation. Russian chemical reviews, 60 (9), P. 967– 979 (1991).</mixed-citation></citation-alternatives></ref><ref id="cit12"><label>12</label><citation-alternatives><mixed-citation xml:lang="ru">Mittova I.Ya., Tomina E.V., et al. Thermal oxidation of InP surfaces modified with NiO + PbO mixtures. Inorganic Materials, 41 (4), P. 323–330 (2005).</mixed-citation><mixed-citation xml:lang="en">Mittova I.Ya., Tomina E.V., et al. Thermal oxidation of InP surfaces modified with NiO + PbO mixtures. Inorganic Materials, 41 (4), P. 323–330 (2005).</mixed-citation></citation-alternatives></ref><ref id="cit13"><label>13</label><citation-alternatives><mixed-citation xml:lang="ru">Mittova I.Ya., Tomina E.V., Lapenko A.A., Khorokhordina A.O. Solid-state reactions during thermal oxidation of vanadium-modified GaAs surfaces. Inorganic Materials, 40 (5), P. 441–444 (2004).</mixed-citation><mixed-citation xml:lang="en">Mittova I.Ya., Tomina E.V., Lapenko A.A., Khorokhordina A.O. Solid-state reactions during thermal oxidation of vanadium-modified GaAs surfaces. Inorganic Materials, 40 (5), P. 441–444 (2004).</mixed-citation></citation-alternatives></ref><ref id="cit14"><label>14</label><citation-alternatives><mixed-citation xml:lang="ru">Lapenko A.A., Tomina E.V., et al. Dynamics of the surface composition and structure of InP oxidized in the presence of V and V2O5. Inorganic Materials, 44 (11), P. 1163–1168 (2008).</mixed-citation><mixed-citation xml:lang="en">Lapenko A.A., Tomina E.V., et al. Dynamics of the surface composition and structure of InP oxidized in the presence of V and V2O5. Inorganic Materials, 44 (11), P. 1163–1168 (2008).</mixed-citation></citation-alternatives></ref><ref id="cit15"><label>15</label><citation-alternatives><mixed-citation xml:lang="ru">Sladkopevtsev B.V., Mittova I.Ya., Tomina E.V., Burtseva N.A. Growth of vanadium oxide films on InP under mild conditions and thermal oxidation of the resultant structures. Inorganic Materials, 48 (2), P. 161– 168 (2012).</mixed-citation><mixed-citation xml:lang="en">Sladkopevtsev B.V., Mittova I.Ya., Tomina E.V., Burtseva N.A. Growth of vanadium oxide films on InP under mild conditions and thermal oxidation of the resultant structures. Inorganic Materials, 48 (2), P. 161– 168 (2012).</mixed-citation></citation-alternatives></ref><ref id="cit16"><label>16</label><citation-alternatives><mixed-citation xml:lang="ru">Giorgetti M., Berrettoni M., Smyrl W.H. Doped V2O5-Based cathode materials: Where does the doping metal go? An -ray absorption Spectroscopy study. Chemistry of materials, 19 (24), P. 5991–6000 (2007).</mixed-citation><mixed-citation xml:lang="en">Giorgetti M., Berrettoni M., Smyrl W.H. Doped V2O5-Based cathode materials: Where does the doping metal go? An -ray absorption Spectroscopy study. Chemistry of materials, 19 (24), P. 5991–6000 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit17"><label>17</label><citation-alternatives><mixed-citation xml:lang="ru">Petkov V., Trikalitis P.N., et al. Structure of V2O5nH2O xerogel solved by the atomic pair distribution function technique. Journal of the American Chemical Society, 124 (34), P. 10157–10162 (2002).</mixed-citation><mixed-citation xml:lang="en">Petkov V., Trikalitis P.N., et al. Structure of V2O5nH2O xerogel solved by the atomic pair distribution function technique. Journal of the American Chemical Society, 124 (34), P. 10157–10162 (2002).</mixed-citation></citation-alternatives></ref><ref id="cit18"><label>18</label><citation-alternatives><mixed-citation xml:lang="ru">Semenenko D.A., Kulova T.L., et al. Electrophysical properties of V2O5 xerogels with lithium embedding as a function of the synthesis process. International scientific journal for alternative energy and ecology, 4 (48), P. 82–86 (2007).</mixed-citation><mixed-citation xml:lang="en">Semenenko D.A., Kulova T.L., et al. Electrophysical properties of V2O5 xerogels with lithium embedding as a function of the synthesis process. International scientific journal for alternative energy and ecology, 4 (48), P. 82–86 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit19"><label>19</label><citation-alternatives><mixed-citation xml:lang="ru">Balakhonov S.V., Ivanov V.K., Barantchikov A.E., Churagulov B.R. Differences in physical and chemical properties of vanadium oxide nanomaterials synthesized by hydrothermal and microwave-hydrothermal methods. Nanosystems: physics, chemistry, mathematics, 3 (4), P. 66–74 (2012).</mixed-citation><mixed-citation xml:lang="en">Balakhonov S.V., Ivanov V.K., Barantchikov A.E., Churagulov B.R. Differences in physical and chemical properties of vanadium oxide nanomaterials synthesized by hydrothermal and microwave-hydrothermal methods. Nanosystems: physics, chemistry, mathematics, 3 (4), P. 66–74 (2012).</mixed-citation></citation-alternatives></ref><ref id="cit20"><label>20</label><citation-alternatives><mixed-citation xml:lang="ru">Berezina O.Ya., Velichko A.A., et al. Metal-semiconductor transition in nonstoichiometric vanadium dioxide films. Inorganic Materials, 43 (5), P. 505–511 (2007).</mixed-citation><mixed-citation xml:lang="en">Berezina O.Ya., Velichko A.A., et al. Metal-semiconductor transition in nonstoichiometric vanadium dioxide films. Inorganic Materials, 43 (5), P. 505–511 (2007).</mixed-citation></citation-alternatives></ref><ref id="cit21"><label>21</label><citation-alternatives><mixed-citation xml:lang="ru">Vinichenko D.A., Zlomanov V.P., et al. Synthesis of vanadium dioxide films by a modified sol-gel process. Inorganic Materials, 47 (3), P. 279–284 (2011).</mixed-citation><mixed-citation xml:lang="en">Vinichenko D.A., Zlomanov V.P., et al. Synthesis of vanadium dioxide films by a modified sol-gel process. Inorganic Materials, 47 (3), P. 279–284 (2011).</mixed-citation></citation-alternatives></ref><ref id="cit22"><label>22</label><citation-alternatives><mixed-citation xml:lang="ru">Mittova I.Ya., Tomina E.V., Lapenko A.A., Sladkopevtsev B.V. Synthesis and catalytic performance of V2O5 nanoislands produced on the surface of InP crystals by electroexplosion. Inorganic Materials, 46 (4), P. 383– 388 (2010).</mixed-citation><mixed-citation xml:lang="en">Mittova I.Ya., Tomina E.V., Lapenko A.A., Sladkopevtsev B.V. Synthesis and catalytic performance of V2O5 nanoislands produced on the surface of InP crystals by electroexplosion. Inorganic Materials, 46 (4), P. 383– 388 (2010).</mixed-citation></citation-alternatives></ref><ref id="cit23"><label>23</label><citation-alternatives><mixed-citation xml:lang="ru">Mittova I.Ya., Tomina E.V., Lapenko A.A., Sladkopevtsev B.V. The catalytic action of vanadium and its oxides (V) in the oxidation process of AIIIBV semiconductors. Nanosystems: physics, chemistry, mathematics, 3 (2), P. 116–138 (2012).</mixed-citation><mixed-citation xml:lang="en">Mittova I.Ya., Tomina E.V., Lapenko A.A., Sladkopevtsev B.V. The catalytic action of vanadium and its oxides (V) in the oxidation process of AIIIBV semiconductors. Nanosystems: physics, chemistry, mathematics, 3 (2), P. 116–138 (2012).</mixed-citation></citation-alternatives></ref><ref id="cit24"><label>24</label><citation-alternatives><mixed-citation xml:lang="ru">Tret’yakov N.N., Mittova I.Ya., et al. Effect of the procedure of chemostimulator application on the surface characteristics of VxOy/InP structures in the process of their thermooxidation. Russian Journal of General Chemistry, 83 (8), P. 1589–1593 (2013).</mixed-citation><mixed-citation xml:lang="en">Tret’yakov N.N., Mittova I.Ya., et al. Effect of the procedure of chemostimulator application on the surface characteristics of VxOy/InP structures in the process of their thermooxidation. Russian Journal of General Chemistry, 83 (8), P. 1589–1593 (2013).</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
