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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="en"><front><journal-meta><journal-id journal-id-type="publisher-id">najo</journal-id><journal-title-group><journal-title xml:lang="en">Nanosystems: Physics, Chemistry, Mathematics</journal-title><trans-title-group xml:lang="ru"><trans-title>Наносистемы: физика, химия, математика</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">2220-8054</issn><issn pub-type="epub">2305-7971</issn><publisher><publisher-name>Университет ИТМО</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">najo-957</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>GRAPHENE</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>GRAPHENE</subject></subj-group></article-categories><title-group><article-title>Investigation of structure and transport properties of graphene grown by low-pressure no flow CVD on polycrystalline Ni films</article-title><trans-title-group xml:lang="ru"><trans-title></trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Kononenko</surname><given-names>O. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><email xlink:type="simple">oleg@iptm.ru</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Matveev</surname><given-names>V. N.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Field</surname><given-names>D. P.</given-names></name></name-alternatives><bio xml:lang="en"><p>Pullman</p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Matveev</surname><given-names>D. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><xref ref-type="aff" rid="aff-3"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Bozhko</surname><given-names>S. I.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><xref ref-type="aff" rid="aff-3"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Roshchupkin</surname><given-names>D. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Vdovin</surname><given-names>E. E.</given-names></name></name-alternatives><bio xml:lang="en"><p>Chernogolovka</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Baranov</surname><given-names>A. N.</given-names></name></name-alternatives><bio xml:lang="en"><p>Moscow</p></bio><xref ref-type="aff" rid="aff-4"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-2"><institution>School of Mechanical and Materials Engineering, Washington State University</institution><country>United States</country></aff><aff xml:lang="en" id="aff-3"><institution>Institute of Solid State Physics, Russian Academy of Sciences</institution><country>Russian Federation</country></aff><aff xml:lang="en" id="aff-4"><institution>Moscow State University</institution><country>Russian Federation</country></aff><pub-date pub-type="collection"><year>2014</year></pub-date><pub-date pub-type="epub"><day>15</day><month>08</month><year>2025</year></pub-date><volume>5</volume><issue>1</issue><fpage>117</fpage><lpage>122</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Kononenko O.V., Matveev V.N., Field D.P., Matveev D.V., Bozhko S.I., Roshchupkin D.V., Vdovin E.E., Baranov A.N., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Kononenko O.V., Matveev V.N., Field D.P., Matveev D.V., Bozhko S.I., Roshchupkin D.V., Vdovin E.E., Baranov A.N.</copyright-holder><copyright-holder xml:lang="en">Kononenko O.V., Matveev V.N., Field D.P., Matveev D.V., Bozhko S.I., Roshchupkin D.V., Vdovin E.E., Baranov A.N.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://nanojournal.ifmo.ru/jour/article/view/957">https://nanojournal.ifmo.ru/jour/article/view/957</self-uri><abstract><p>Graphene films were synthesized by the low-pressure no flow CVD on polycrystalline nickel catalyst films grown by the self-ion assisted deposition technique at different biases. Graphene films were transferred to a SiO2/Si substrate using PMMA. The graphene grown on Ni films with bimodal grain size distribution and weaker (111) texture had higher thickness uniformity and a lower number of graphene layers. The graphene grown on Ni films with a monomodal grain size distribution and stronger (111) texture had lower thickness uniformity and a higher number of graphene layers. The transport properties of the graphene films were investigated with the aid of Hall measurements.</p></abstract><kwd-group xml:lang="en"><kwd>Graphene</kwd><kwd>CVD Synthesis</kwd><kwd>Electronic properties</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Novoselov K.S., Geim A.K., et al. Two-dimensional gas of massless Dirac fermions in graphene. Nature, 438, P. 197–200 (2005).</mixed-citation><mixed-citation xml:lang="en">Novoselov K.S., Geim A.K., et al. 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