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Наносистемы: физика, химия, математика

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The divacancy V2 and V – C = C – V configurations on the diamond surface: quantum-chemical simulation

https://doi.org/10.17586/2220-8054-2016-7-1-87-92

Аннотация

This paper presents the results for the quantum-chemical modeling of V2 and V – C = C – V divacancy defects configurations on the C(111) – 2×1 diamond surface. We provide calculations for the geometric, electronic, and energy characteristics for these configurations. Energy characteristics of water and hydrogen molecule adsorption on the surface with divacancy defects are estimated. The presence of V2 and V – C = C – V divacancy defects are shown to change the mechanism and energy characteristics of molecular adsorption.

Об авторах

O. Yu. Ananina
Zaporizhzhya National University, Physical Faculty
Украина

Zaporizhzhya



N. A. Lvova
Technological Institute for Superhard and Novel Carbon Materials
Россия

Troitsk, Moscow



E. V. Severina
Zaporizhzhya National University, Physical Faculty
Украина

Zaporizhzhya



Список литературы

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3. Filicheva Yu.A., Lvova N.A., Ananina O.Yu. Quantum-Chemical Simulation of Interaction of Hydrogen with Diamond Nanoclusters. Fuller., Nanotub. Carbon Nanostr., 2012, 20 (4–7), P. 616–621.

4. Lvova N.A., Ananina O.Yu. Quantum Chemical Simulations of Water Adsorption on a Diamond (100) Surface with Vacancy Defects. Russian J. Phys. Chem. A, 2013, 87 (9), P. 1515–1519.

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8. Pandey K.C. New p-bonded chain model for Si(111)-(2?1) surface. Phys. Rev. Lett., 1981, 47 (26), P. 1913–1917.


Рецензия

Для цитирования:


Ananina O.Yu., Lvova N.A., Severina E.V. The divacancy V2 and V – C = C – V configurations on the diamond surface: quantum-chemical simulation. Наносистемы: физика, химия, математика. 2016;7(1):87-92. https://doi.org/10.17586/2220-8054-2016-7-1-87-92

For citation:


Ananina O.Yu., Lvova N.A., Severina E.V. The divacancy V2 and V – C = C – V configurations on the diamond surface: quantum-chemical simulation. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(1):87-92. https://doi.org/10.17586/2220-8054-2016-7-1-87-92

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ISSN 2220-8054 (Print)
ISSN 2305-7971 (Online)