Annealing effects on V2O5-x thin films deposited by non reactive sputtering
https://doi.org/10.17586/2220-8054-2016-7-3-547-552
Abstract
Thin films of vanadium oxide (V2O5−x) were prepared by rf magnetron sputtering process and are heat treated to study the annealing effect. As-deposited thin films are amorphous in nature and crystallinity is improved by annealing the sample. Thin layers with high density and small grain size varying from 36 nm to 70 nm were seen in the FESEM images of as-deposited thin films. In the case of annealed thin films, it has been transformed to thin elongated rod like structure with 202.5 nm length and an average diameter of approximately 48 nm. Optical properties were studied by using UV-Vis-NIR spectrophotometer and the reduction in transmission in annealed thin films is due to the crystalline nature of thin films. Studies were done on the samples by taking photoluminescence and Laser Raman spectra.
About the Authors
D. Rachel Malini
The American College
India
India
Department of Physics
Madurai-625002
R. Sivakumar
Directorate of Distance Education, Alagappa University
India
India
Karaikudi-630004
C. Sanjeeviraja
A.C. College of Engg. & Tech
Russian Federation
Russian Federation
Department of Physics
Karaikudi-630004
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Review
For citations:
Malini D., Sivakumar R., Sanjeeviraja C. Annealing effects on V2O5-x thin films deposited by non reactive sputtering. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(3):547-552. https://doi.org/10.17586/2220-8054-2016-7-3-547-552
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