Для цитирования:

Malini D., Sivakumar R., Sanjeeviraja С. Annealing effects on V₂O_5-x thin films deposited by non reactive sputtering. Наносистемы: физика, химия, математика. 2016;7(3):547-552. https://doi.org/10.17586/2220-8054-2016-7-3-547-552

For citation:

Malini D., Sivakumar R., Sanjeeviraja C. Annealing effects on V₂O_5-x thin films deposited by non reactive sputtering. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(3):547-552. https://doi.org/10.17586/2220-8054-2016-7-3-547-552