Characterization studies on the novel mixed thin films
https://doi.org/10.17586/2220-8054-2016-7-4-683-686
Abstract
Among electrochemical processes having a considerable impact on technical development, the mixed thin film (Mo-Ni oxide) plays an important role, due to its better mechanical, anticorrosive and thermal stability characteristics. The mixed films have been prepared by dip spin coating. The films are grown on substrates like Indium Tin Oxide (ITO) and are well adherent on the substrates, pinhole free and transparent. The X-ray diffraction analysis of the films confirms they are polycrystalline in nature. The morphological study reveals that the uniform distributions have flower-like structure. From the compositional analysis, the EDAX spectra show the presence of molybdenum and nickel. The optical band gap was found to be 1.36 eV and band assignments for Fourier Transform Infrared (FTIR) spectra are comparable to reported values.
About the Authors
P. Ramasundari
S. V. N. College
India
India
P. G. & Research Department of Physics
Madurai
S. Ganeshan
Vivekananda College
India
India
Department of Physics
Madurai
R. Vijayalakshmi
Thiagarajar. College
India
India
P. G. & Research Department of Physics
Madurai
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Review
For citations:
Ramasundari P., Ganeshan S., Vijayalakshmi R. Characterization studies on the novel mixed thin films. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(4):683-686. https://doi.org/10.17586/2220-8054-2016-7-4-683-686
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