Temperature influence study on copper selenide films
https://doi.org/10.17586/2220-8054-2016-7-4-699-702
Abstract
Copper selenide was prepared by film is successfully deposited on a Fluorine-doped Tin Oxide (FTO) substrate by a brush plating technique. The film was uniform, had good adherence to the substrate and was annealed at 300 °C and 500 °C. As the annealing temperature increased, the orientation of the crystallites is more randomized than in the as-prepared film. The structural and optical properties of the film were investigated by XRD, SEM, EDAX, UV-Visible and PL. The XRD pattern indicated that this film was crystalline in the structure.
About the Authors
V. Rajendran
Vivekananda College
India
India
Department of Physics
Madurai 625234
S. Arulmozhi Packiaseeli
Fatima College
India
India
P. G. & Research Department of Physics
Madurai 625018
S. Muthumari
Thiagarajar. College
India
India
P. G. & Research Department of Physics
Madurai 625009
R. Vijayalakshmi
Thiagarajar. College
India
India
P. G. & Research Department of Physics
Madurai 625009
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Review
For citations:
Rajendran V., Arulmozhi Packiaseeli S., Muthumari S., Vijayalakshmi R. Temperature influence study on copper selenide films. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(4):699-702. https://doi.org/10.17586/2220-8054-2016-7-4-699-702
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