Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition
https://doi.org/10.17586/2220-8054-2016-7-4-621-623
Abstract
Titanium oxide (TiO2) films were deposited on silicon (100) and quartz substrates at various substrate temperatures (300 – 873 K) at an optimized oxygen partial pressure of 3.0 × 10−2 mbar by pulsed laser deposition. The effect of substrate temperature on structure, surface morphology and optical properties of the films were investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and photoluminescence spectroscopy (PL) respectively. The XRD results showed that the films are polycrystalline in nature and have tetragonal structure. The film prepared at higher substrate temperature showed strong rutile phase. The results indicated that all the films possess both phases (anatase and rutile) of titania. The AFM shows the crystalline nature, dense, uniform distribution of the nanocrystallites with a surface roughness of 2 –8 nm. The photoluminescence studies showed the asymmetric peak ∼ 370 nm indicating the bandgap for the TiO2 films.
About the Authors
G. Balakrishnan
Bharath Institute of Science and Technology, Bharath Institute of Higher Education and Research
India
India
Centre of Excellence in Patterned Multiferroics & Nanotechnology
Chennai – 73
S. Manavalan
Bharath Institute of Science and Technology, Bharath Institute of Higher Education and Research
India
India
Department of Mechanical Engineering
Chennai – 73
R. Venkatesh Babu
Sri Lakshmi Ammal Engineering College
India
India
Department of Mechanical Engineering
Chennai – 126
J. I. Song
Chanwon National University
Korea, Republic of
Korea, Republic of
Department of Mechanical Engineering
Changwon – 641773
References
1. Gyorgy E., Socol G., et al. Appl. Surf. Sci., 2005, 247 (4), P. 429–433.
2. Tay B.K., Zhao Z.W., Chua D.H.C. Mater. Sci. Eng. Rep., 2006, 52 (1), P. 178–182.
3. Byun C., Jang J.W., et al. Mater. Res. Bull., 1997, 32 (5), P. 431–440.
4. Vorotilov K.A., Drlova E.V., Petrovsky V.L. Thin Solid Films, 1992, 207, P. 135–144.
5. Pulker H.K., Paesold G., Ritter E. Appl. Opt., 1976, 15, P. 2986.
6. Lu J.P., Wang J., Raj R. Thin Solid Films, 1991, 204, L13.
7. Suhail M.H., Mohan Rao G., Mohan S.J. Appl. Phys., 1992, 71 (3), P. 1421.
8. Argelia Perez-Pacheco, Prieto C., Castaneda-Guzma R., Garcia-Lopez J. Thin Solid Films, 2009, 517, P. 5415.
9. Balakrishnan G., Vengala Rao Bandi, et al. Mater. Res. Bull., 2013, 48, P. 4901.
10. Ben Amor S., Baud G., Besse J.P., Jacquet M. Mater. Sci. Eng. B, 1997, 47, P. 110.
11. Chung C.K., Liao M.W., Lai C.W. Thin Solid Films, 2009, 518, P. 1415.
12. Madhu Kumar P., Badrinarayanan S., Murali S. Thin Solid Films, 2000, 358, P. 122.
13. Gaurav Shukla, Pratima K. Mishra, Alika Khare. J. Alloy Compd., 2010, 489, P. 246.
Review
For citations:
Balakrishnan G., Manavalan S., Venkatesh Babu R., Song J.I. Effect of substrate temperature on microstructure and properties of nanocrystalline titania thin films prepared by pulsed laser deposition. Nanosystems: Physics, Chemistry, Mathematics. 2016;7(4):621-623. https://doi.org/10.17586/2220-8054-2016-7-4-621-623
Views:
6
Email this article 