Preview

Nanosystems: Physics, Chemistry, Mathematics

Advanced search

Calculation of characteristics of subnanometer delta-doped layers in diamond in the quasi-classical approach

https://doi.org/10.17586/2220-8054-2026-17-3-291-296

Abstract

It is shown that subnanometer boron delta-doped layers characteristics in chemically vapor deposited diamond films can be calculated in the quasi-classical approximation both in equilibrium and in an external electromagnetic field ionizing doping boron atoms. The corresponding solutions are found, in the first case – analytically, in the second – numerically. The use of the quasi-classical approximation allows one to simplify significantly the mathematical modeling of diamond structures with subnanometer delta-doped layers, necessary for their application in nanoelectronics, for example in high-speed field-effect transistors.

About the Authors

V. A. Kukushkin
Federal Research Center A. V. Gaponov-Grekhov Institute of Applied Physics of the Russian Academy of Sciences; National Research Lobachevsky State University of Nizhny Novgorod
Russian Federation

Vladimir A. Kukushkin – Federal Research Center A. V. Gaponov-Grekhov Institute of Applied Physics of the RAS, Nizhny Novgorod, Russia; National Research Lobachevsky SU of Nizhny Novgorod.

Nizhny Novgorod



Yu. V. Kukushkin
National Research Lobachevsky State University of Nizhny Novgorod
Russian Federation

Yuriy V. Kukushkin

Nizhny Novgorod



References

1. Schubert E.F. In Semiconductors and Semimetals, Vol 40. Academic Press, Inc., New York, USA, 1994, ch. 1.

2. Fiori A., Tran Thi T.N., Chicot G., Jomard F., Omnes F., Gheeraert E., Bustarret E. In situ etching-back processes for a sharper top interface in boron delta-doped diamond structures. Diamond Relat. Matter, 2012, 24, P. 175–178.

3. Araujo D., Alegre M.P., Pinero J.C., Fiori A., Bustarret E., Jomard F. Boron concentration profiling by high angle annular dark field-scanning transmission electron microscopy in homoepitaxial δ-doped diamond layers. Appl. Phys. Lett, 2013, 103, 042104.

4. Fiori A., Jomard F., Teraji T., Koizumi S., Isoya J., Gheeraert E., Bustarret E. Synchronized B and 13C Diamond Delta Structures for an Ultimate In-Depth Chemical Characterization. Appl. Phys. Express, 2013, 6, 045801.

5. Fiori A., Jomard F., Teraji T., Chicot G., Bustarret E. Improved depth resolution of secondary ion mass spectrometry profiles in diamond: A quantitative analysis of the delta-doping. Thin Solid Films, 2014, 557, P. 222–226.

6. Volpe P.N., Tranchant N., Arnault J.C., Saada S., Jomard F., Bergonzo P. Ultra-sharp boron interfaces for delta doped diamond structures. Phys. Status Solidi-R, 2012, 6, P. 59–61.

7. Shiomi H., Nishibayashi Y., Toda N., Shikata S. Pulse-doped diamond p-channel metal semiconductor field-effect transistor. IEEE Electr. Dev. Lett, 1995, 16, P. 36–38.

8. Vescan A., Gluche P., Ebert W., Kohn E. High-temperature, high-voltage operation of pulse-doped diamond MESFET. IEEE Electr. Dev. Lett, 1997, 18, P. 222–224.

9. Butler J.E., Vikharev A., Gorbachev A., Lobaev M., Muchnikov A., Radischev D., Isaev V., Chernov V., Bogdanov S., Drozdov M., Demidov E., Surovegina E., Shashkin V., Davidov A., Tan H., Meshi L., Pakpour-Tabrizi A.C., Hicks M.-L., Jackman R.B. Nanometric diamond delta doping with boron. Phys. Status Solidi-R, 2017, 11, 1600329.

10. Chicot G., Fiori A., Volpe P.N., Tran Thi T.N., Gerbedoen J.C., Bousquet J., Alegre M.P., Pinero J.C., Araujo D., Jomard F., Soltani A., De Jaeger J.C., Morse J., Hartwig J., Tranchant N., Mer-Calfati C., Arnault J.C., Delahaye J., Grenet T., Eon D., Omnes F., Pernot J., Bustarret E. Electronic and physico-chemical properties of nanometric boron delta-doped diamond structures. J. Appl. Phys, 2014, 116, 083702.

11. Lobaev M.A., Vikharev A.L., Gorbachev A.M., Radishev D.B., Arkhipova E.A., Drozdov M.N., Isaev V.A., Bogdanov S.A., Kukushkin V.A. Investigation of boron-doped delta layers in CVD diamond grown on single-sector HPHT substrates. Nanosystems: Phys. Chem. Math., 2022, 13 (5), P. 578–584.

12. Scharpf J., Denisenko A., Pakes C.I., Rubanov S., Bergmaier A., Dollinger G., Pietzka C., Kohn E. Transport behaviour of boron delta-doped diamond. Phys. Status Solidi A, 2013, 210 (10), P. 2028–2034.

13. El-Hajj H., Denisenko A., Bergmaier A., Dollinger G., Kubovic M., Kohn E. Characteristics of boron δ-doped diamond for electronic applications. Diamond Relat. Mater., 2008, 17 (4–5), P. 409–414.

14. Ashcroft N.W., Mermin N.D. Solid State Physics. Harcourt College Publishers, New York, USA, 1976, 826 p.

15. Willatzen M., Cardona M., Christensen N.E. Linear muffin-tin-orbital and k-p calculations of effective masses and band structure of semiconducting diamond. Phys. Rev. B, 1994, 50, 18054.

16. Madelung O. Semiconductors: Data Handbook. Springer, Berlin, Germany, 2004.

17. Blakemore J.S. Semiconductor Statistics. Dover, Mineola, NY, USA, 2002.

18. Seeger K. Semiconductor Physics: An Introduction. Springer, Berlin, 2004.

19. Landau L.D., Lifshitz E.M. Quantum Mechanics: Non-relativistic Theory. Pergamon Press, New York, 1965, 616 p.

20. Aksenova A.S., Altuhov A.A., Ryabeva E.V., Samosadnyi V.T., Feshchenko V.S., Chernyaev A.P., Shepelev V.A. The investigation of boron-doped diamond absorbance spectrum. IOP Conf. Series: Journal of Physics: Conf. Series, 2017, 798, 012149.

21. Schreck M., Sˇajev P., Tra¨ger M., Mayr M., Gru¨nwald T., Fischer M., Gsell S. Charge carrier trapping by dislocations in single crystal diamond. J. Appl. Phys., 2020, 127, 125102.

22. Pernot J., Volpe P.N., Omne`s F., Muret P., Mortet V., Haenen K., Teraji T. Hall hole mobility in boron-doped homoepitaxial diamond. Phys. Rev. B, 2010, 81, 205203.


Review

For citations:


Kukushkin V.A., Kukushkin Yu.V. Calculation of characteristics of subnanometer delta-doped layers in diamond in the quasi-classical approach. Nanosystems: Physics, Chemistry, Mathematics. 2026;17(3):291-296. (In Russ.) https://doi.org/10.17586/2220-8054-2026-17-3-291-296

Views: 270

JATS XML


Creative Commons License
This work is licensed under a Creative Commons Attribution 4.0 License.


ISSN 2220-8054 (Print)
ISSN 2305-7971 (Online)