NANOSYSTEMS: PHYSICS, CHEMISTRY, MATHEMATICS, 2014, 5 (1), P. 172-177
SECONDARY NUCLEATION ON NANOSTRUCTURED CARBON FILMS IN THE PLASMA OF DIRECT CURRENT GLOW DISCHARGE
K. V. Mironovich – Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow, Russia; mironbasket@mail.ru
V. A. Krivchenko – Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow, Russia
P. V. Voronin – Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow, Russia
S. A. Evlashin – Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University, Moscow, Russia
The high speci c surface area of carbon nanowalls (CNWs) makes them an attractive catalyst support material or electrode material for energy storage devices (e.g. supercapacitors, Li-ion batteries). Secondary nucleation processes (formation of secondary nanowalls on the surface of pre-grown primary structures) play an important role in CNWs growth. It can signi cantly increase CNW lm surface area, but at the same time be a limiting step for the production of lms with an open pore structure. Both of these factors may be important for the applications mentioned above. In this work, we discuss possible mechanisms of secondary nucleation during CNW growth in the plasma of a direct current glow discharge. We also demonstrate a novel multi-step synthesis process with controllable secondary nucleation rates at di erent stages, which is an eff ective way to modulate CNW lm morphology and produce lms with desirable surface area and porosity.
Keywords: Carbon nanowalls, PECVD, Synthesis, Secondary nucleation, Morphology, Surface area.
PACS 68.55.A-