NANOSYSTEMS: PHYSICS, CHEMISTRY, MATHEMATICS, 2016, 7 (3), P. 547–552
Annealing effects on V2O5-x thin films deposited by non reactive sputtering
D. Rachel Malini – Department of Physics, The American College, Madurai-625002, India
R.Sivakumar – Directorate of Distance Education, Alagappa University, Karaikudi-630004, India
C. Sanjeeviraja – Department of Physics, A.C. College of Engg. & Tech., Karaikudi-630004, India; sanjeeviraja@rediffmail.com
Thin films of vanadium oxide (V2O5-x) were prepared by rf magnetron sputtering process and are heat treated to study the annealing effect. As-deposited thin films are amorphous in nature and crystallinity is improved by annealing the sample. Thin layers with high density and small grain size varying from 36 nm to 70 nm were seen in the FESEM images of as-deposited thin films. In the case of annealed thin films, it has been transformed to thin elongated rod like structure with 202.5 nm length and an average diameter of approximately 48 nm. Optical properties were studied by using UV-Vis-NIR spectrophotometer and the reduction in transmission in annealed thin films is due to the crystalline nature of thin films. Studies were done on the samples by taking photoluminescence and Laser Raman spectra.
Keywords: vanadium oxide, rf magnetron sputtering, annealing.
PACS 68
DOI 10.17586/2220-8054-2016-7-3-547-552